Micro-Electro-Mechanical Systems, or MEMS, is a technology that in its most general form can be defined as miniaturized mechanical and electro-mechanical. This definition provides an introduction to MEMS technology devices and their applications. Learn how MEMS are manufactured and how MEMS sensors and. Micro-electro-mechanical-systems (MEMS) are combinations of mechanical and electrical structures with μm size elements for sensing or actuating, integrated.
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Microelectromechanical systems - Wikipedia
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It was commercially used during the s in Switzerland, for micromachining quartz orders of magnitudes harder than micromachining silicon. MEMS acronym was so powerful during the s, that with micro electro mechanical systems choice microsensors and microactuators that included micromachining, all joined MEMS by a soft landing.
As a result, the MEMS micro electro mechanical systems was more attractive for publicity and even today MEMSis dominating in microtechnologies without giving credit to its real parents.
This was a breakthrough micro electro mechanical systems MEMS technology, but it did not appear in literature until DuringRockwell applied micro-optics to the system development of several industrial applications, including, microlenses for silicon focal planes,  high speed binary microlens in GaAs,  antireflection surfaces in silicon,  thin film microlens arrays,  beam steering device,  microlens integration with focal plane arrays,  and optical transformer and collimator.
This profile approximates the ideal kinoform lens micro electro mechanical systems. If a photosensitive material is selectively exposed to radiation e. This exposed region can then be removed or treated providing a mask for the underlying substrate.
Photolithography is typically used with metal or other thin film deposition, wet and dry etching. Sometimes, photolithography is used to create structure without any kind of post etching.
One example is SU8 based lens where SU8 based square blocks are generated.
Then the photoresist is melted to form a semi-sphere which acts as a lens. Micro electro mechanical systems beam lithography[ edit ] Main article: Electron beam lithography Electron beam lithography often abbreviated as e-beam lithography is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film called micro electro mechanical systems resist "exposing" the resist and of selectively removing either exposed or non-exposed regions of the resist "developing".
The purpose, as with photolithographyis to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching.
It was developed for manufacturing integrated circuitsand is also used for creating nanotechnology architectures. The primary advantage of electron beam lithography micro electro mechanical systems that it is one of the ways to beat the diffraction limit of light and make features in the nanometer range.
Microelectronic integrated circuits can be thought of as the "brains" of a system micro electro mechanical systems MEMS augments this decision-making capability with "eyes" and "arms", to allow microsystems to sense and control the environment.
Sensors gather information from micro electro mechanical systems environment through measuring mechanical, thermal, biological, chemical, optical, and magnetic phenomena. The electronics then process the information derived from the sensors and through some decision making capability direct the actuators to respond by moving, positioning, regulating, pumping, and filtering, thereby controlling the environment for some desired outcome or purpose.